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Beilstein J. Nanotechnol. 2017, 8, 2181–2185, doi:10.3762/bjnano.8.217
Figure 1: Schematic of the near-field etching process.
Figure 2: Experimental setup for the near-field wet etching technique.
Figure 3: Time dependence of surface roughness using a solution (wet etchng). AFM images taken (a) before etc...
Figure 4: Time dependence of Fourier power spectra using a solution. Fourier power spectra taken (a) before e...
Figure 5: Time dependence of surface roughness. AFM images taken (a) before etching and (b) after 30 min. (c)...
Figure 6: Time dependence of Fourier power spectra using a gas. Fourier power spectra taken (a) before etchin...